SPI Supplies Plasma Prep III Etcher with Process Controller and Fomblin Pump

SPI Supplies Plasma Prep III Etcher with Pfeiffer Vacuum DUO 3 Pump, Fomblin Oil, & Process Controll
Chamber Pyrex 110 Volt
Item11050PP-AB
AvailabilityContact for Availability
$16,709.75
SPI Supplies Plasma Prep III Etcher with Pfeiffer Vacuum DUO 3 Pump, Fomblin Oil, & Process Controll
Chamber Pyrex 220 Volt
Item11050PP-AX
AvailabilityContact for Availability
$16,709.75
SPI Supplies Plasma Prep III Etcher w/ Pfeiffer Vacuum DUO 3 Pump, Fomblin Oil, Process Controller,
Chamber Quartz 110 Volt
Item11050PPQ-AB
AvailabilityContact for Availability
$17,481.15
SPI Supplies Plasma Prep III Etcher w/ Pfeiffer Vacuum DUO 3 Pump, Fomblin Oil, Process Controller,
Chamber Quartz 220 Volt
Item11050PPQ-AX
AvailabilityContact for Availability
$17,481.15

SPI Supplies Plasma Prep III Etcher with Process Controller and  Fomblin Pump: 110V or 220V, Pyrex or Quartz Chamber options.

The Plasma Prep III RF plasma-based unit is a compact tabletop design with ease of use to deliver the 1 to 100W system performance. Furthermore, the small footprint allows the system to fit neatly in most any laboratory environment. We have combined equipment options to offer complete systems that are ready for use out of the box. Add your tank of process gas, a two-stage regulator, and the hosing to the gas inlet and you are ready to run your system.
  
Features:
• Flexible range. Capable of 1 to 100W operation
• Greater stability
• Reproducible conditions.
• Small footprint (10.5" H X 14.75" W X 12" D measurements)
• Integrated vacuum gauge
• Measurement and adjustment of forwarding and reverse power
• Digital metering
• 110/220V compatible
• 4" diameter x 6" depth Pyrex or Quartz Chamber
• Multiple gas input
• Run time control 

Who would use this system?

The basic functions and use of the PP III are identical to that of the PP II. For those users who have long process times (in terms of tens of hours to days), the solid state unit provides excellent stability so that the user can run the system overnight without concern about a change in operating conditions.

For those with or looking at multiple systems, the PP III allows easy adjustment of system conditions so those units in the same laboratory or even those in different locations can be run in a similar fashion. Of course, there still remain a number of external variables that may affect these systems including gas and gas pressures and the difference in line voltages.

The PP III operates at 13.56 MHz operation. It is CE Certified and RoHS Compliant.

Pyrex or Quartz Chambers?

The selection of the chamber material is typically based on the intended process gas to be used. Pyrex is used in most cases when running gasses such as oxygen, argon, nitrogen or air. These gasses do not attack the Pyrex glass. The use of gasses such as carbon tetrafluoride (CF4) or trichloromethyl (CCl3) do produce free radicals that will etch Pyrex so in those cases we suggest using a quartz chamber.

Why a Fomblin Pump?

Most Plasma Prep III users are running oxygen or CF4 as process gas(es) through their systems, both of which suggest using a fomblinized pump. Therefore we offer our combination systems using such a pump.  

The PP III has one gas input through an optional Process Controller is available. Many gasses and gas mixtures may be used including oxygen, argon and carbon tetrafluoride.

Click here to watch a video on the operation of the SPI Plasma Prep™ III Plasma Etcher