292 nm Holographic Diffraction Grating Magnification Standard, Non-Traceable, Unmounted
Specifications of the sample:
292 nm pitch, one-dimensional grating. Accurate to +/- 1% (3 standard deviations).
Titanium lines on Silicon chip, 3 x 4mm. Line height (about 30 nm) and line width (about 130 nm) are not calibrated.
Description of the sample:
The sample is best characterized by its high contrast and excellent edge definition. In AFM, use in contact, intermittent contact (TappingMode™ ) and other modes with image sizes from 500 nm to 20 µm. Use SEM beam voltages from under 1 kV to 30 kV. Useful from 5,000x to over 200,000x. In Auger electron spectroscopy and focused ion beam (FIB) applications, use similar conditions as for SEM.
The calibrated pattern covers the entire 3 x 4 mm chip. There is sufficient area to make literally thousands of measurements without reusing any areas altered or contaminated from pervious scans.