Model 292UTC Magnification Standard, 292nm Pitch, Traceable

Model 292UTC Magnification Standard, 292nm Pitch, Traceable, Unmounted
Mount Unmounted
Item1500292UTCU-AB
AvailabilityContact for Availability
$4,774.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, JEOL 1501 Mount
Mount JEOL 1501
Item1501292UTCM-AB
AvailabilityContact for Availability
$5,047.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, Topcon 1504 Mount
Mount Topcon 1504
Item1504292UTCM-AB
AvailabilityContact for Availability
$5,047.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, FEI 1506 Pin-Mount
Mount FEI 1506
Item1506292UTCM-AB
AvailabilityContact for Availability
$5,047.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, AMRAY Pin-Mount
Mount AMRAY Pin-Mount
Item1509292UTCM-AB
AvailabilityContact for Availability
$5,047.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, Universal 1510 Mount
Mount Universal 1510
Item1510292UTCM-AB
AvailabilityContact for Availability
$5,047.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, Hitachi Pin-Mount
Mount Hitachi Pin
Item1575292UTCM-AB
AvailabilityContact for Availability
$5,047.00
Model 292UTC Magnification Standard, 292nm Pitch, Traceable, 12mm AFM Steel Disk
Mount 12mm AFM Steel
Item292UTCMAFM-AB
AvailabilityContact for Availability
$4,774.00

Model 292UTC, High Magnification, High Resolution Traceable Calibration Standard

Disciplines: AFM, SEM, Auger and FIB
Period: 292 nm pitch, one-dimensional grating. Accurate to +/- 1% (3 standard deviations).
Line height: approximately 30 nm (not calibrated).
Line width: Approximately 130 nm (not calibrated).
Surface: Titanium lines on Silicon wafer, 3 x 4mm.

A precision, holographic pattern featuring high accuracy, usability and stability. Its moderate ridge height makes it convenient for AFM. This specimen provides high contrast and excellent edge definition. It provides accurate calibration for high resolution, nanometer-scale measurements. The calibrated pattern covers the entire chip. There is sufficient usable area to make tens of thousands of measurements without reusing any areas altered or contaminated by previous scans. AFM: use in contact, intermittent contact (Tapping Mode) and other modes with image sizes from 500 nm to 20 µm.

SEM: Suitable with beam voltages from under 1 kV to 30 kV. Useful from 5,000x to over 200,000x. Excellent contrast in back-scatter as well as secondary electron imaging.

Auger and Focused Ion Beam (FIB): use similar conditions as for SEM.

Available unmounted to accommodate all SEM stages. For AFM, available unmounted or mounted on 12 mm steel disks.

Model 292UTC is a traceable, certified standard from a select grade. Each sample is individually measured in comparison with a similar specimen calibrated at the PTB. (This is the Physikalisch-Technischen Bundesanstalt. As the "national standards laboratory of Germany", it is the German counterpart to NIST in the USA.) The uncertainty of single pitch values is typically +/- 2 nm (95% confidence interval). When measuring average pitch over N pitch periods, the uncertainty will be reduced approximately by a factor square-root of N.  For example, the mean pitch over 4 periods would have uncertainty about +/- 1 nm. See certificate of traceable calibration for details.

Just need non-traceable reference material? Choose Model 301BE