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Plasma Prep III
Plasma Prep III

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Plasma Prep III

The Plasma Prep III (PP III) is the new generation of the popular and long serving Plasma Prep II RF based unit. With its compact tabletop design and ease of use, the new generation now employs a solid state design to deliver the same 100W system performance. Furthermore, the small footprint allows the system to fit neatly in most any laboratory environment.

The Plasma Prep III (PP III) is latest solid state version of the popular and long serving Plasma Prep II RF based unit. The unit features:

  • Flexible range. Capable of 1 to 100W operation
  • Greater stability
  • Reproducible conditions.
  • Small footprint (10.5" H X 14.75" W X 12" D)
  • Integrated vacuum gauge
  • Display and adjustment of forward and reverse power levels
  • Digital metering
  • 110/220V compatible
  • 4" diameter x 6" depth Pyrex or Quartz Chamber

Click here to watch a video on the operation of the SPI Plasma Prep™ III Plasma Etcher

Items in Plasma Prep III