MRS-6 Geller Magnification Reference Standard

MRS-6 Geller Magnification Reference Standard,2.0x2.0 x0.5mm thick,Traceable
Material (XY) Traceable
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MRS-6 Geller Magnification Reference Standard,2.0x2.0 x0.5mm thick,Non-traceable
Material (Not Traceable)
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MRS-6 Geller Magnification Reference Standard,2.0x2.0 x0.5mm thick,Non-traceable(
Material Recertification
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A Standard Ahead of Its Time:

The MRS-6 represents a next step in calibration standards. The nanotechnology sized patterns are a good test of your imaging systems.

NIST and NPL (NIST counterpart in the U.K.) Traceable, Magnification Reference Standard & Stage Micrometer. For Instrument Calibration from

1,500X – 1,000,000X (80nm min. pitch).

  • Electron Microscopy: SEM (secondary & backscattered electrons), TEM (for use with a bulk holder)- the MRS-6 is conveniently sized at 2 X 2 X ½ mm.
  • Scanning Microscopies and Profilometry: STM, AFM, stylus and optical etc. The pattern height is approximately 15 nm over single crystal silicon.
  • Optical Microscopy: reflected, bright/dark field, differential contrast, and confocal.
  • Chemical mapping: EDS, WDS, micro/macro XRF, XPS, Auger & others. The pattern is fabricated using 15 nm chromium film over single crystal silicon.
  • Resolution testing:  With a series of 3 bar targets (similar to the USAF 1953 patterns) ranging in size from 80nm to 3μm.
  • Linearity testing: With a 1μm 2 patch pitch over 40 X 40μm.

The MRS-6 is fabricated by using the highest accuracy electron direct write semiconductor manufacturing equipment available today. The pattern is built on a silicon wafer with ~15 nm Cr film. This film, which is significantly thinner that that of the MRS-5, has superior edge quality. Imaging contrast in both secondary and backscattered electron mode is possible with field emission SEMs and newer tungsten or LaB6 SEMs. The overall size is ~ 3 mm X 3 mm X ¼ mm thick. The MRS-6 is fully conductive. No conductive coatings are necessary.