701-D Mounted on 12 mm Steel Disk
For General Purpose and Metrology Microscopes
A precision pattern providing accurate calibration in the horizontal plane for very high resolution, nanometer-scale measurements.
Period: 70 nm pitch, one-dimensional array. Refer to calibration certificate for actual pitch.
Surface: Silicon Oxide ridges on Silicon, 4x3 mm die. Ridge height (about 35 nm) and width (about 35 nm) are not calibrated. The specimens are produced by a series of process steps including interferometric lithography. The period of the line-space pattern is uniform without stitching errors.
For AFM, use in contact, intermittent contact (TappingModeTM ) and other modes with image sizes from 100 to 3000 nm. Available unmounted or mounted on steel disks.
For SEM, this specimen works well at a wide range of accelerating voltages (1 kV to 20 kV have been tested) and calibrates images from 25 kX to 1000 kX. Normally supplied unmounted. Can be mounted on a stub of your choice.
Usability: the calibrated pattern covers a 1.2x0.5 mm area. There is sufficient usable area to make thousands of measurements without reusing any areas altered or contaminated by previous scans. For the most accurate results, always measure pitch in an area that has uniform contrast. Do not bridge across areas with noticeably different appearance.
Model 70-1D. This Calibration Reference specimen comes with a non-traceable, manufacturer’s certificate. This states the average period (accurate to +/- 0.25 nm), based on batch measurements.
Model 70-1DUTC. This Traceable, Certified Standard is "NIST-traceable" (traceable to the SI international standard meter) by measurements made in comparison with a standard calibrated at NIST. The uncertainty of the average and single pitch values are typically better than +/- 0.05 and +/- 0.5 nm, respectively (95% confidence interval). See certificate of traceable calibration for details. This 70-nm pitch standard was the subject of a recent interlaboratory comparison involving ASM, NIST and NMC/A-STAR (the Singapore counterpart of NIST).