150-2D mounted on FEI/Leica/LEO/Cambridge/Philips Pin-Type Mount 25.4 tableX3.2 diameterX7.5mmlength
General Purpose - High Precision
A precision, holographic pattern providing accurate calibration in the horizontal plane for very high resolution, nanometer-scale measurements.
Period: 144 nm pitch, two-dimensional array. Accurate to +/- 1 nm. Refer to calibration certificate for actual pitch.
Surface: Aluminum bumps on Silicon, 4x3 mm die. Bump height (about 90 nm) and width (about 75 nm) are not calibrated.
For AFM, use in contact, intermittent contact (TappingModeTM ) and other modes with image sizes from 250 nm to 10 mm. Available unmounted or mounted on 12 mm steel disks.
For SEM, this specimen works well at all accelerating voltages. Normally supplied unmounted. Can be mounted on a stub of your choice.
Usability: the calibrated pattern covers the entire chip. There is sufficient usable area to make tens of thousands of measurements without reusing any areas altered or contaminated by previous scans.
Model 150-2D. This Calibration Reference specimen comes with a non-traceable, manufacturer’s certificate. This states the average period, based on batch measurements.
Model 150-2DUTC. This Traceable, Certified Standard is a select grade. Each standard is individually measured in comparison with a similar specimen calibrated at PTB. (PTB, Physikalisch-Technischen Bundesanstalt, is the German counterpart of NIST.) The uncertainty of single pitch values is typically +/- 1.4 nm (95% confidence interval). Multi-pitch measurements provide the usual square-root of N improvement in precision.