For General Purpose and Metrology Microscopes
A precision pattern providing accurate calibration in the horizontal plane for very high resolution, nanometer-scale measurements.
Period: 70 nm pitch, one-dimensional array. Refer to calibration certificate for actual pitch.
Surface: Silicon Oxide ridges on Silicon, 4x3 mm die. Ridge height (about 35 nm) and width (about 35 nm) are not calibrated. The specimens are produced by a series of process steps including interferometric lithography. The period of the line-space pattern is uniform without stitching errors.