Working with an SEM (CD) Part of Protrain Series of Electron Microscopy Short Courses
Each course from M1 to M5 are 35 to 50 minutes long. In these courses, a slide is presented with 30 to 80 seconds of sound in which the student can choose to move on or study the slide further. Courses M1 through M3 make up what is called the “Intensive SEM” course. M6, the maintenance course, will take the average student about two and a half hours complete.
All courses will run on Windows 3.X, 95, 98, NT, ME, 2000, XP, and Vista.
A four part course that covers SEM and EDS
The "Working with an SEM" CD actually consists of not one but four different free standing courses dealing with different aspects of the topic.
A basic introduction for all operators. We aim to give the minimum theory necessary to understand the microscope, making the operating procedures more understandable. This course covers: The CRT (cathode ray tubes), magnification, image formation, spot size limitation, the electron gun, lenses, deflection coils, the condenser system, focus and astigmatism, aberrations, saturation methods, spot size control, working distance, aperture alignment, image recording, operating procedures, guide lines to operation covering kV, spot size, magnification, and working distance.
Understanding the way the electron beam reacts with the specimen and a better interpretation of results becomes a real possibility. This course covers: Beam-specimen reactions, reaction paths, reaction volumes, Monte Carlo simulations, Everhart-Thornley detector, BSE (back scatter electron) detectors, image contrasts, image formation, specimen charge, the object of specimen supports, specimen mounts, fixing specimens in place, high angle mounts, cross sections, reasons and materials for coating, sputter coating, sputter coating problems, evaporative metal coating, carbon coating.
SEM has a fast moving history, this course demonstrates the features that scientists are using when they push the SEM to its limit. The course covers: Beam-specimen reactions in relation to the imaged signal, the five reactions that give secondary electrons (SE), the three reactions that give BSE, demonstration micrographs, low kV signals, improving performance, the three sources - their specifications, improving the standard tungsten hairpin performance, LaB6, field emission, spot size selection, kV, WD and resolution, external field influence, monitoring optimum signal levels, detector geometry - normal, in lens, double detector in lens, double detector out of lens, and high resolution performance.
Aimed at those using the SEM with x-ray energy analysis (EDX) we try to take the witchcraft out of the procedure. The course covers: Electron scatter, characteristic and background x-ray production, the Si(Li) detector, x-ray windows, the processing system and dead time, artifact peaks, the presentation and shape of KLM lines, optimizing the specimen to detector geometry, calibration, working with a spectrum, using KLM markers, qualitative and quantitative analysis and the critical parameters, standards, no standards and quantitative data requirements.
Specifications for viewing:
PC compatible computer with Windows 95, 98, ME, NT, 2000, XP and Vista.