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SPI Supplies Plasma Prep III Etcher with Fomblin Pump
SPI Supplies Plasma Prep III Etcher with Fomblin Pump
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SPI Supplies Plasma Prep III Etcher with Fomblin Pump

Chamber Options for SPI Supplies Plasma Prep III Etcher with Fomblin Pump
Chamber Pyrex 110 Volt
Item Number 11050P-AB
Availability Contact for Availability
Price  $13,205.15
Chamber Pyrex 220 Volt
Item Number 11050P-AX
Availability Contact for Availability
Price  $13,205.15
Chamber Quartz 110 Volt
Item Number 11050PQ-AB
Availability Contact for Availability
Price  $13,976.90
Chamber Quartz 220 Volt
Item Number 11050PQ-AX
Availability Contact for Availability
Price  $13,976.90

SPI Supplies Plasma Prep III Etcher with Fomblin Pump: 110V or 220V, Pyrex or Quartz Chamber options.

The Plasma Prep III (PP III) is the new generation of the popular and long-serving Plasma Prep II RF based unit. With its compact tabletop design and ease of use, the new generation now employs a solid state design to deliver the same 100W system performance. Furthermore, the small footprint allows the system to fit neatly in most any laboratory environment.We have combined equipment options to offer complete systems that are ready for use out of the box. Add your tank of process gas, a two stage regulator, and the hosing to the gas inlet and you are ready to run your system.
• Flexible range. Capable of 1 to 100W operation
• Greater stability
• Reproducible conditions.
• Small footprint (10.5" H X 14.75" W X 12" D measurements)
• Integrated vacuum gauge
• Measurement and adjustment of forwarding and reverse power
• Digital metering
• 110/220V compatible
• 4" diameter x 6" depth Pyrex or Quartz Chamber

Who would use this system?

The basic functions and use of the PP III are identical to that of the PP II. For those users who have long process times (in terms of tens of hours to days), the solid state unit provides excellent stability so that the user can run the system overnight without concern about a change in operating conditions.
For those with or looking at multiple systems, the PP III allows easy adjustment of system conditions so those units in the same laboratory or even those in different locations can be run in a similar fashion. Of course, there still remain a number of external variables that may affect these systems including gas and gas pressures and the difference in line voltages.

The PP III operates at 13.56 MHz operation. It is CE Certified and RoHS Compliant.

Why a Fomblin Pump?

Most Plasma Prep III users are running oxygen or CF4 as process gas(es) through their systems, both of which suggest using a fomblinized pump. Therefore we offer our combination systems using such a pump.  

The PP III has one gas input through an optional Process Controller is available. Many gasses and gas mixtures may be used including oxygen, argon and carbon tetrafluoride.

Click here to watch a video on the operation of the SPI Plasma Prep™ III Plasma Etcher