292 nm Holographic Diffraction Grating Magnification Standard, Non-Traceable Hitachi Pin-Mount
A precision 292 nm holographic diffraction grating for SEM, AFM, Auger and FIB features high accuracy, usability and stability. Its moderate ridge height makes it the most convenient of specimens for AFM, and SEM, especially for backscattered electron imaging, because of the high contrast between Ti and Si. It is an outstanding sample for high resolution, nanometer-scale measurements.
Specifications of the sample:
292 nm pitch, one-dimensional grating. Accurate to +/- 1% (3 standard deviations).
Titanium lines on Silicon chip, 3 x 4mm. Line height (about 30 nm) and line width (about 130 nm) are not calibrated.
Description of the sample:
The sample is best characterized by its high contrast and excellent edge definition. In AFM, use in contact, intermittent contact (TappingMode™ ) and other modes with image sizes from 500 nm to 20 µm. Use SEM beam voltages from under 1 kV to 30 kV. Useful from 5,000x to over 200,000x. In Auger electron spectroscopy and focused ion beam (FIB) applications, use similar conditions as for SEM.
The calibrated pattern covers the entire 3 x 4 mm chip. There is sufficient area to make literally thousands of measurements without reusing any areas altered or contaminated from pervious scans.
For SEM applications, SPI Supplies offers the sample ether mounted on a variety of different popular mount geometries, or unmounted. So far as we know, the SPI Holographic Diffraction Grating can be used in any commercially available SEM or stage.
For AFM, the sample can be purchased either unmounted or mounted on 12 mm steel disks.
Non-Traceable vs. Certified
There are two versions, Model 301BE non-traceable and Model 292UTC traceable and certified.
For SEM APPLICATIONS:
Model 301BE Holographic Diffraction Grating Magnification Standard
Non-traceable with manufacturer's certificate stating the average period, based on batch measurements.