A Standard Ahead of Its Time:
The MRS-6 represents a next step in calibration standards. The nanotechnology sized patterns are a good test of your imaging systems.
NIST and NPL (NIST counterpart in the U.K.) Traceable, Magnification Reference Standard & Stage Micrometer. For Instrument Calibration from
1,500X – 1,000,000X (80nm min. pitch).
The MRS-6 is fabricated by using the highest accuracy electron direct write semiconductor manufacturing equipment available today. The pattern is built on a silicon wafer with ~15 nm Cr film. This film, which is significantly thinner that that of the MRS-5, has superior edge quality. Imaging contrast in both secondary and backscattered electron mode is possible with field emission SEMs and newer tungsten or LaB6 SEMs. The overall size is ~ 3 mm X 3 mm X ¼ mm thick. The MRS-6 is fully conductive. No conductive coatings are necessary.