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SPI Supplies Gold Coated Silicon Wafer Substrate, 4" (100 mm) Diameter, 100 nm Gold thickness, Pk 1
SPI Supplies Gold Coated Silicon Wafer Substrate, 4" (100 mm) Diameter, 100 nm Gold thickness, Pk 1
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SPI Supplies Gold Coated Silicon Wafer Substrate, 4" (100 mm) Diameter, 100 nm Gold thickness, Pk 1

Item Number 4176GSW-AB
Availability In Stock
Quantity Price/EACH
1 to 9 $567.00
10 to 29 $510.30
30 and up $481.95

SPI Supplies Gold Coated Silicon Wafers

SPECIFICATIONS:

  • Size: 4 inch (100 mm) Diameter
  • Gold layer: 100 nm by vacuum evaporation
  • <100> orientation.
  • Chromium adhesion layer: 10 nm
  • Wafer thickness: 525 µm

There are many applications for high quality, gold coated silicon substrates for nano applications, ranging from SEM, AFM and other scanning probe microscopies, cell culture, protein DNA microarrays, and reflectometry. While many laboratories do have the needed electron beam or vacuum evaporator equipment needed to do the gold coatings, very few are set up with a dedicated apparatus, and one that would be free of the contamination present in the typical multi-user facility. It has been established that low level contaminants can interfere with the surface properties and characteristics of cell growth.

How high in temperature can these substrates be taken without the gold coating peeling off? That temperature is generally thought to be about 150°C and could be stable up to and above 250°C. If too high of a temperature is used , it is possible for the gold to start delaminating from the surface.