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Applied NanoStructures provide an assortment of high aspect ratio probes
for trench depth measurements with different tilt compensation.
These probes can be used for both process characterization and monitoring.
We carry various probes design to meet the needs of the semiconductor industry
up to the 45nm technology node. The different tilt compensation angle is
design to fit to multiple AFM systems. If none of these probes meet your
requirements, please contact us and we will be happy to modify our products
to suit your needs.
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