SPI Supplies

Osmium Plasma Coaters

Silicon wafer resist sample

Direct original magnification: 60,000 X

Coating Device: Osmium plasma coater
Coating Material: Osmium
Coating Thickness: 3 nm
Accelerating Voltage: 5.0 kV
Direct original magnification: 150,000 X

Coating Device: Osmium plasma coater
Coating Material: Osmium
Coating Thickness: 3 nm
Accelerating Voltage: 5.0 kV



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Thursday February 09, 2012
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