SPI Supplies

Osmium Plasma Coaters

Hole in photo resist layer, on silicon

Direct original magnification: 50,000X

Coating Device: Osmium plasma coater
Coating Material: Osmium
Coating Thickness: 5 nm
Accelerating Voltage: 1.0 kV
SEM: Hitachi Model S-5000H
Direct original magnification: 50,000X

Coating Device: None
Coating Material: Uncoated
Coating Thickness: Not applicable
Accelerating Voltage: 1.0 kV
SEM: Hitachi Model S-5000H



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Saturday July 04, 2009
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