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| Direct magnification: 10,000 X | Direct magnification: 100,000X |
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Coating Device: Osmium Plasma Coater Coating Material: Osmium metal Coating Thickness: 3 nm Accelerating Voltage: 10.0KV |
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| Direct magnification: 10,000 X | Direct magnification: 100,000X |
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Coating Device: Magnetron Sputter Coater Caoting Material: Pt/Pd Coating Thickness: 3 nm Accelerating Voltage: 10.0KV | |
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| Direct magnification: 10,000 X | Direct magnification: 100,000X |
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Coating Device: Ion Beam Sputtering Device Caoting Material: W Coating Thickness: 1.5 nm Accelerating Voltage: 10.0KV | |
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