SPI Supplies

Osmium Plasma Coaters

Barium titanate: Reduced charging at low magnifications with minimal coating thickness

Direct magnification: 10,000 X Direct magnification: 100,000X
Coating Device: Osmium Plasma Coater
Coating Material: Osmium metal
Coating Thickness: 3 nm
Accelerating Voltage: 10.0KV


Direct magnification: 10,000 X Direct magnification: 100,000X
Coating Device: Magnetron Sputter Coater
Caoting Material: Pt/Pd
Coating Thickness: 3 nm
Accelerating Voltage: 10.0KV


Direct magnification: 10,000 X Direct magnification: 100,000X
Coating Device: Ion Beam Sputtering Device
Caoting Material: W
Coating Thickness: 1.5 nm
Accelerating Voltage: 10.0KV
Work of the following researcher:

Ms. S. Inazato
Characterization Technology Group
Matsushita Electronic Industrial Co., Ltd.



To Ask a Question or Make a Comment

To Place an Order or Request a Quote


Return to:
Tuesday October 07, 2008
© Copyright 1998, 1999, 2000. By Structure Probe, Inc.
Contacting SPI Supplies and Structure Probe, Inc.
All rights reserved.
All trademarks and trade names are the property of their respective owners.
Privacy Policy

Worldwide Distributors, Representatives, and Agents Flag logo