Just released in 2006, the MRS-5 is the latest in the series of Geller SEM magnification standards. It has taken the best of features found in the earlier Geller standards, and expanded on them to create what we believe is by far the most useful and most credible of any standard offered for the calibration of the magnification of an SEM.
The MRS-5 Geller Magnification Reference Standard is the latest in the series of Geller standards for the calibration of all SEMs. The MRS-4 featured areas of pitch of 500 nm. The MRS-5 standard features areas of pitch of 80 nm. With the recent growth of high resolution FESEMs (field emission scanning electron microscopes), there has been a growing need for this higher level magnification calibration tool.
The MRS-5 is a 2 mm x 2 mm silicon die, 0.5 mm thick, with a thin SiO2 passivation film and over that, a 100 nm tungsten film. The pattern is etched in the tungsten film, stopping at the SiO2 layer. The pitch is described as a cycle, the distance of a bar plus a space (e..g the repeat distance).
The Geller MRS-5 Magnification Reference Standard is traceable to the National Physical Laboratory (NPL) in the United Kingdom. NPL is the counterpart to NIST in the USA. There is a mutual recognition agreement between NIST and NPL recognizing each others measurements.
Some (competitive) high resolution standards for SEM applications are traceable via optical diffraction methods to determine the pattern frequency which does not account for frequency variations in the pattern. We consider this to be a less satisfactory method to the need for measurements. For the Geller standards, the measurements are made correctly, measuring and providing traceability for the individual pattern.
So far as we can determine, the data thus far from the MRS-5, suggests that the 100 nm pattern uncertainty is better than ±3.6 nm (1σ).