SPI PlasmaPrep X™ Parallel Plate Plasma Etcher

The ideal solution for anisotropic etching

Introduction to anisotropic etching:
For laboratory applications, the typical plasma etcher has a "barrel" design, or in other words, a cylindrical or barrel geometry to the reaction chamber. One feature of this design is that any point on the surface to be etched can be approached with equal probability from all directions, leading to an etch that is described as being "isotropic". For most if not many applications generally, an isotropic design is probably the design of choice. But in some instances, such as the removal of a passivation layer from an electronic device, isotropic etching always results in undercutting, and when the lines are below a certain point in width, such processing completely undercuts the lines leading to the layers literally falling off. But because for a "barrel" design, one can achieve respectable etch rates at relatively low power, the systems can be built and sold at lower prices.

The parallel plate design of an anisotropic etcher permits one to remove a passivation layer without any undercutting! Now we don't want to make it sound like the physics of anisotropic etching were discovered by us (this was certainly not the case) but we were the first to realize the laboratory need for a small relatively inexpensive table top parallel plate system. And in 1985, SPI Supplies introduced the world's first inexpensive table-top design parallel plate system. Most of those systems produced as far back as twenty years ago are still in operation.

Who needs the PlasmaPrep X Parallel Plate Plasma Etcher?
This system is designed primarily for one application, that is, for the anisotropic removal of glass passivation layers for failure analysis in the solid state electronics industry. It is typically used with CF₄ (or some other reactive fluorine gas) as the primary gas. Two separate gas inputs are available on the PlasmaPrep X system.

If you are not working in a failure analysis setting in the solid state electronics industry, and in need of removing glass passivation layers, then this system is probably not for you. Of course we do realize that there can be other applications for anisotropic etching, but they do tend to be in the electronics industry. If you feel you have an application but are outside of the electronics industry, let us know your proposed application(s) so that we can share our own experiences over the years conducting studies with anisotropic etching.

If you feel you would not normally "qualify" as being a target customer for the Plasma Prep X, then in all likelihood you would be a candidate for purchase of our highly popular PlasmaPrep II isotropic plasma etcher.

The all new SPI PlasmaPrep X:
Several years ago, the PlasmaPrep X was taken out of production for a complete redesign. The power supply is now all solid state and the unit features many of the advances in electronics that have occurred in the past few years.

Feature highlights

Two gas inputs, run separately or together; flow rates controlled by needle valves.
Rugged circuitry and automatic monitors.
RF Power is continuously variable (1-150 watts) at 13.56 MHz with a crystal controlled oscillator.
RF Power Transfer: 125 mm electrodes (2), water-cooled.
Unit accommodates a 7" wafer in a work chamber that is 10" dia. x 5-1/2" high.
Cooling water flows at a rate of 2 to 4 liters/minute to prevent heat damage to the forward power plate electrode.

A:Before etching, original device with glass passivation layer.
B:After etching (isotropic) with SPI PlasmaPrep II etcher for 30 minutes.
C:After etching (anisotropic) with SPI PlasmaPrep X etcher for 90 minutes.

Basic unit with Pyrex Chamber	SPI #	Each	In Stock
SPI PlasmaPrep X (110 V)	11006-AB	$ 33013.23	No
SPI PlasmaPrep X (220 V)	11006-AX	33013.23	No

Basic unit with Quartz Chamber
SPI PlasmaPrep X (110 V) with Quartz Chamber	11006X-AB	$ 33567.19	No
SPI PlasmaPrep X (220 V) with Quartz Chamber	11006X-AX	33567.19	No

Recommended Pump
"Fomblinized" Leybold Model	10405-AB	$ 4325.00	No

Replacement Chambers
10" Pyrex Chamber	11028-AB	$ 1007.18	No
10" Quartz Chamber	11029-AB	1678.64	No

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Contacting SPI Supplies and Structure Probe, Inc.
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