SPI Plasma Etchers
Select from plasma etchers or plasma cleaners, what ever your needs,
SPI has you covered!
Remember that if your application is to remove "material" as opposed to
atomic or molecular layers of adsorbed contamination, then you probably would
require an "etcher" and not a "cleaner". Generally speaking, an etcher,
sometimes called a plasma reactor,
operates at 100 watts or higher, and a "cleaner" operates at 50 watts or lower, in some
instances as low as 10 watts. The higher power of the etcher is usually required
to move "material" such as photoresist residue on a wafer but a plasma cleaner is
more appropriate for the removal of surface sorbed contamination from a fragile
TEM specimen. There is of course some overlap and some instances where either
system can be used, so keep in mind that the information just given is more of a
"rule of thumb" and should you have any further questions about appropriateness
or application, just ask!
SPI Plasma Prep™ Plasma Cleaner
for plasma cleaning specimens, holders and rod assemblies for TEM applications.
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Wednesday May 14, 2008
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