Be sure to request either the µ-center
mark or the >< center mark. If no pattern is selected, the default
pattern will be the one with the µ-center mark. The filmed coatings
will be as described, but note that what we have described as "Silicon
Dioxide (SiO2)/Monoxide (SiO)" is the result
of an evaporation of SiO
(silicon monoxide) at high vacuum and the end result is generally thought
to be a combination of SiO2 and SiO. In any
case, for nearly all users of this product, what seems to be important is
not knowing the precise composition, but knowing that in a
plasma etcher, oxygen will
not etch or otherwise harm the film.
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