Be sure to request either the µ-center mark or the >< center mark. If no pattern is selected, the default pattern will be the one with the µ-center mark. The filmed coatings will be as described, but note that what we have described as "Silicon Dioxide (SiO2)/Monoxide (SiO)" is the result of an evaporation of SiO (silicon monoxide) at high vacuum and the end result is generally thought to be a combination of SiO2 and SiO. In any case, for nearly all users of this product, what seems to be important is not knowing the precise composition, but knowing that in a plasma etcher, oxygen will not etch or otherwise harm the film.
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