Osmium Plasma Coaters
Comparison of different coating methods vs. osmium coating using the OPC
osmium coaters
Introduction:
We wish to report here the results of some very carefully controlled
experimental depositions comparing and contrasting osmium coating vs. five
different popular coating methods. The gold, gold/palladium, and platinum
coatings were done in standard "SEM laboratory" sputter coaters. The carbon
coating was done via vacuum evaporation using a standard laboratory vacuum
evaporator. The osmium coating was done in an OPC-60N Osmium Plasma Coater.
We wish to acknowledge and thank Mr. Jim Young for sharing these remarkable
results with us here at SPI Supplies and for giving us permission to make
known the results of his work.
Discussion of results:
The coating thickness was controlled to the point that it would simulate a
thickness typical for that kind of coating for a typical SEM sample. Hence,
we can expect the gold coating to be thicker than the osmium coating
thickness. But it is also clear to see that the thickness for each of the
six coatings was sufficient to provide for a charge-free surface. The scale
bar represents a distance of 200 nm and is the same magnification in all six
micrographs (and coating systems).
What is so remarkable here is that with this resolution and detail, for the
osmium coating there is not even a hint of a grain structure or grain size.
This is but another reason why we believe the osmium plasma coating approach
is second to none in terms of making conductive samples for viewing by SEM.
Contribution to improved contrast in images:
We should not forget that a metallization coating is not just to reduce or
eliminate charging, it is also helpful to impart to the image enhanced
contrast. So even when conductivity is not an issue, the osmium coating can
play a role in the development of contrast in an unknown image.
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Tuesday May 13, 2008
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